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CAS NO.94442-22-5
Product Name: | (Trimethyl)methylcyclopentadienylplatinum(IV) |
Synonyms: | Methylcyclopentadienyl trimethyl platinum;Trimethyl(methylcyclopentadienyl)platinum(IV) packaged for use in deposition systems;(Trimethyl)methylcyclopentadienylplatinum(IV), 99%, 78-1350, contained in 50 ml Swagelok cylinder for CVD/ALD;(TriMethyl)MethylcyclopentadienylplatinuM(IV),98%;(η5-methylcyclopentadienyl)trimethylplatinum(IV);(TriMethyl)MethylcyclopentadienylplatinuM(IV), 99%, 78-1350, contained in 50 Ml Swagelokcylinder high teMperature valve (96-1071) for CVD/ALD |
CAS: | 94442-22-5 |
MF: | C9H9Pt |
MW: | 312.26 |
EINECS: | 629-612-1 |
Product Categories: | Pt;ALD Precursors;Platinum;Precursors by Metal;Vapor Deposition Precursors;metallocene |
Mol File: | 94442-22-5.mol |
Uses | Platinum complex widely used in CVD and ALD applications due, in part, to its simplicity (only C,H and Pt), volatility and moderate decomposition temperatures. |
Chemical Properties | white to off-white crystals or crystalline powder |
Uses | (Trimethyl)methylcyclopentadienylplatinum(IV) was used for the deposition of ultrathin metallic layers of platinum by electron beam induced deposition, atomic sputtering.These deposits find application in microelectronics, catalysis, photonics and chemical sensing. |
Uses | Trimethyl(methylcyclopentadienyl)platinum(IV) is used as an organometallic precursor for platinum. It is used in the microelectronics, catalysis, photonics and chemical sensing processes. It is used for the deposition of ultrathin metallic layers of platinum by the electron beam induced deposition process. |
Uses | Precursors Packaged for Depositions Systems |
General Description | Trimethyl(methyl cyclopentadienyl)platinum(IV) ( MeCpPtMe3) is a commonly used organometallic precursor for platinum. |
HANGZHOU TIANYE CHEMICALS Co.LTD , Located in Eastern Science and Innovation Park Hangzhou .
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